A report from Reuters claims that scientists in China have created a prototype of a machine that could eventually be used to produce semiconductor chips capable of powering artificial intelligence. Sources told the publication that a team in Shenzhen completed the prototype of an extreme ultraviolet lithography machine earlier this year and it is allegedly now undergoing testing. The EUV machine was reportedly made by former engineers from Dutch semiconductor supplier ASML. Reuters states that China is targeting production of its own EUV chips beginning in 2028, although other experts have projected 2030 as a more likely date. EUV is a supremely complicated bit of technology; we have an explainer below that gets into some of the details. It is at the heart of the chips made by companies s [...]
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ASML is working to cut the time it takes to build and test its extreme ultraviolet lithography machines by roughly a third, CFO Roger Dassen told reporters on Wednesday. The cycle time, the period bet [...]
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High NA EUV was supposed to debut on Intel’s 14A node towards the end of the decade. It has turned up early, on Panther Lake, patterning layers that are also qualified to run on the old tools. A mac [...]
China is on track to dominate consumer artificial intelligence applications and robotics manufacturing within years, but the United States will maintain its substantial lead in enterprise AI adoption [...]